JPH05662B2 - - Google Patents

Info

Publication number
JPH05662B2
JPH05662B2 JP63135483A JP13548388A JPH05662B2 JP H05662 B2 JPH05662 B2 JP H05662B2 JP 63135483 A JP63135483 A JP 63135483A JP 13548388 A JP13548388 A JP 13548388A JP H05662 B2 JPH05662 B2 JP H05662B2
Authority
JP
Japan
Prior art keywords
reticle
foreign matter
light
optical system
reflected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63135483A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01452A (ja
JPS64452A (en
Inventor
Yukio Uto
Masataka Shiba
Mitsuyoshi Koizumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP63135483A priority Critical patent/JPS64452A/ja
Publication of JPH01452A publication Critical patent/JPH01452A/ja
Publication of JPS64452A publication Critical patent/JPS64452A/ja
Publication of JPH05662B2 publication Critical patent/JPH05662B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP63135483A 1988-06-03 1988-06-03 Detection of foreign matter Granted JPS64452A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63135483A JPS64452A (en) 1988-06-03 1988-06-03 Detection of foreign matter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63135483A JPS64452A (en) 1988-06-03 1988-06-03 Detection of foreign matter

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP57192462A Division JPS5982727A (ja) 1982-11-04 1982-11-04 異物検出方法及びその装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP3096770A Division JPH0816651B2 (ja) 1991-04-26 1991-04-26 両面異物検出方法及びその装置

Publications (3)

Publication Number Publication Date
JPH01452A JPH01452A (ja) 1989-01-05
JPS64452A JPS64452A (en) 1989-01-05
JPH05662B2 true JPH05662B2 (en]) 1993-01-06

Family

ID=15152775

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63135483A Granted JPS64452A (en) 1988-06-03 1988-06-03 Detection of foreign matter

Country Status (1)

Country Link
JP (1) JPS64452A (en])

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5506243B2 (ja) * 2009-05-25 2014-05-28 株式会社日立製作所 欠陥検査装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52129582A (en) * 1976-04-23 1977-10-31 Hitachi Ltd Flaw detector
JPS5686340A (en) * 1979-12-17 1981-07-14 Hitachi Ltd Automatic detector for foreign matter
JPS57128834A (en) * 1981-02-04 1982-08-10 Nippon Kogaku Kk <Nikon> Inspecting apparatus of foreign substance
JPS5982727A (ja) * 1982-11-04 1984-05-12 Hitachi Ltd 異物検出方法及びその装置

Also Published As

Publication number Publication date
JPS64452A (en) 1989-01-05

Similar Documents

Publication Publication Date Title
US4669875A (en) Foreign particle detecting method and apparatus
KR920007196B1 (ko) 이물질 검출방법 및 그 장치
US20050036138A1 (en) System for detecting anomalies and / or features of a surface
JPH02114154A (ja) 欠陥または異物の検査方法およびその装置
JPH07209202A (ja) 表面状態検査装置、該表面状態検査装置を備える露光装置及び該露光装置を用いてデバイスを製造する方法
JP4543141B2 (ja) 欠陥検査装置
JPS6365904B2 (en])
USRE33991E (en) Foreign particle detecting method and apparatus
JPH05100413A (ja) 異物検査装置
JPH0430574B2 (en])
JP2003017536A (ja) パターン検査方法及び検査装置
JPH0228803B2 (en])
JP2539182B2 (ja) 半導体ウエハ上の異物検査方法
JPH0238951A (ja) 異物検出装置及び方法
JP4961615B2 (ja) フォトマスクの検査方法及び装置
JP3282790B2 (ja) 位相シフトマスクの欠陥検査装置
JPS6240656B2 (en])
JPH05662B2 (en])
JP3053096B2 (ja) 異物検出方法およびその装置
JPH0731129B2 (ja) 半導体ウエハ異物検出装置
JPH06258237A (ja) 欠陥検査装置
JPH0312252B2 (en])
JPH0816651B2 (ja) 両面異物検出方法及びその装置
JPH0715441B2 (ja) 異物検出方法及びその装置
JP3106521B2 (ja) 透明基板の光学的検査装置