JPH05662B2 - - Google Patents
Info
- Publication number
- JPH05662B2 JPH05662B2 JP63135483A JP13548388A JPH05662B2 JP H05662 B2 JPH05662 B2 JP H05662B2 JP 63135483 A JP63135483 A JP 63135483A JP 13548388 A JP13548388 A JP 13548388A JP H05662 B2 JPH05662 B2 JP H05662B2
- Authority
- JP
- Japan
- Prior art keywords
- reticle
- foreign matter
- light
- optical system
- reflected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63135483A JPS64452A (en) | 1988-06-03 | 1988-06-03 | Detection of foreign matter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63135483A JPS64452A (en) | 1988-06-03 | 1988-06-03 | Detection of foreign matter |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57192462A Division JPS5982727A (ja) | 1982-11-04 | 1982-11-04 | 異物検出方法及びその装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3096770A Division JPH0816651B2 (ja) | 1991-04-26 | 1991-04-26 | 両面異物検出方法及びその装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JPH01452A JPH01452A (ja) | 1989-01-05 |
JPS64452A JPS64452A (en) | 1989-01-05 |
JPH05662B2 true JPH05662B2 (en]) | 1993-01-06 |
Family
ID=15152775
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63135483A Granted JPS64452A (en) | 1988-06-03 | 1988-06-03 | Detection of foreign matter |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS64452A (en]) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5506243B2 (ja) * | 2009-05-25 | 2014-05-28 | 株式会社日立製作所 | 欠陥検査装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52129582A (en) * | 1976-04-23 | 1977-10-31 | Hitachi Ltd | Flaw detector |
JPS5686340A (en) * | 1979-12-17 | 1981-07-14 | Hitachi Ltd | Automatic detector for foreign matter |
JPS57128834A (en) * | 1981-02-04 | 1982-08-10 | Nippon Kogaku Kk <Nikon> | Inspecting apparatus of foreign substance |
JPS5982727A (ja) * | 1982-11-04 | 1984-05-12 | Hitachi Ltd | 異物検出方法及びその装置 |
-
1988
- 1988-06-03 JP JP63135483A patent/JPS64452A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS64452A (en) | 1989-01-05 |
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